Obiettivo rotante di sputtering di tantalio ad alta purezza 99,99%

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Descrizione del prodotto

Products Description

Product Name	Purity	Density	Surface Condition	Thermal Treatment
Ta Planar Target	3N5	16.65g/cm3	Ground	Annealing
Ta Rotary Target	3N5	16.65g/cm3	Ground	Annealing

Parameters	Typical Value
Composition	Ta
Purity	≥99.99%
Boiling point	5731k (5458 ° C)
Melting point	3290k (3017 ° C)
Size	customized
Electrical resistivity	<2×10-4 Ω·cm

Dimension(mm)
Maximal OD	Maximal Length	Maximal single segment length	Bonding ratio
145-150	3000	250	≥95%

Sunlit TARGET LIST
Applications		Target
Energy-Saving Glass		Ag、SiLa、NiCr、AZO、JZO、TZO、TiOx、ZrOx.....
Smart Glass		JZO、ITO、W、Mo、Cr、Si......
Thin Film PV		AZO、i-ZnO、Mo、ClG......
Touch Panel		Si、ITO、Mo、Cu、Ti、Al、Ag......
Display		Si、ITO、IZO、IGZO、Mo、Ag、W、Al、Cu、Ti.....

Product application
Application
1.Metallizing, Electron-beam Spraying ,sinteting annealing in reducing atmosphere in electronics.
2. Military and light industries
3.Evaporate small lengths of wire or to evaporate materials.
3.Tantalum boat is ideal for use in small evaporation systems.
4.Tantalum boats sources are used for the vacuum evaporation of materials.

Application
Tantalum is widely used in aviation and aerospace industry, high temperature technology, atomic energy industry and chemical industry thanks to its high melting point, corrosion resistance and good cold working performance.

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