Obiettivo rotondo in titanio di alta qualità

Titanium Round Target 

Main performance requirements of target material

 Impurity content

 Impurities in target solids and oxygen and water vapor in pores are the main pollution sources of deposited films. Different target materials for different purposes have different requirements for different impurity content. For example, pure aluminum and aluminum alloy targets used in the semiconductor industry have special requirements for alkali metal content and radioactive element content.

The purity

 Purity is one of the main performance indexes of the target material, because the purity of the target material has a great influence on the performance of the film. But in practice, the purity of target material is not the same. For example, with the rapid development of the microelectronics industry, the size of silicon wafer develops from 6", 8" to 12", and the wiring width decreases from 0.5um to 0.25um,0.18um or even 0.13um. In the past, 99.995% of the target purity can meet the technological requirements of 0.35UMIC. The preparation of 0.18um line requires 99.999% or even 99.9999% purity of target material.

The density

 In order to reduce the porosity in the target solid and improve the properties of the sputtering film, the target is usually required to have a high density. The target density affects not only the sputtering rate but also the electrical and optical properties of the films. The higher the target density, the better the film performance. In addition, increasing the density and strength of the target makes it better able to withstand the thermal stress during sputtering. Density is also one of the key performance indexes of target material.

Products description of 99.99% Purity Titanium Sputtering Target

Item Name	Titanium Sputtering Target
Type	Metal Target
Purity	Customized
Specification	Customized
color	silvery
Shape	planar,Round
Certificate	ISO9001:2008, SGS, The third test report
Grade	Industrial Grade
Usage	Thin Film Coating
Application	Widely used in coating processing industries such as optics, photonics, nanometer materials , PDP, touch panel industry, solar cells, solar photovoltaic application ,decoration and other kind of scientific researches and industrial production fields

Pure Titanium Target
We accept Customized Ratios, Purity and Shape.
Ratios: TiAl5 at%, TiAl10 at%, TiAl20 at%, TiAl25 at%, TiAl 30 at%, TiAl40 at%, TiAl50 at%...
Purity: 99.5%、99.7%、99.8%、99.9%、99.95%、99.99%.
Shape: Circular, Plane, Tube, Arc, Multi-tile...

Impurity Content

Ratios	Ti-75Al at%	Ti-70Al at%	Ti-67Al at%	Ti-60Al at%	Ti-50Al at%	Ti-30Al at%	Ti-20Alat%	Ti-14Al at%
Purity (%)	99.7	99.7	99.7	99.7	99.8/99.9	99.9	99.9	99.9
Density (g/cm3)	3.1	3.2	3.3	3.4	3.63/3.85	3.97	4.25	4.3
Grain Size ((µm)	100	100	100	100	100/-	-	-	-
Production	HIP	HIP	HIP	HIP	HIP/VAR	VAR	VAR	VAR

Titanium Target

Product purity: 99.5%, 99.7%, 99.8%, 99.9%, 99.95%, 99.99%, 99.99%, 99.995%.

We offer form sizes: planar targets, cylindrical targets, arc targets, special-shaped targets and many more.

Titanium, with an atomic number of 22 and an atomic weight of 47.867, is a silvery-white transition metal characterized by light weight, high strength, metallic luster, and resistance to wet chlorine corrosion. α titanium is a hexagonal crystal system, and β titanium is a cubic crystal system. The transition temperature is 882.5 °C. Melting point (1660±10) °C, boiling point 3287 °C, density of 4.506g/cm3. Soluble in dilute acid, insoluble in cold and hot water; seawater corrosion resistance is very strong. Titanium is an important structural metal developed in the 1950s, titanium alloy has low density, high specific strength, good corrosion resistance, low thermal conductivity, non-toxic and non-magnetic, weldable, good biocompatibility, strong surface decoration and other characteristics, widely used in aviation, aerospace, chemical, petroleum, electric power, medical, construction, sporting goods and other fields.